ASML光刻机介绍实用教案.ppt

Course Overview•System Overview•Basic Operation•Recovery第1页/共30页第一页，共31页•PAS 5500 WAFER SCANNER OVERVIEW•Purpose The PAS 5500 is a fully automatic step-and-repeat camera for exposing wafers used for manufacturing of integrated circuits. The system forms part of a lithographic process, and is suitable for batch production of large and very large scale integrated circuits. System Overview第2页/共30页第二页，共31页 The PAS 5500 wafer scanner comprises the following main units:•Exposure unit,•Wafer transport system,•Operator console,•Electronics cabinet,•Contamination and Temperature (C&T) cabinet.System Overview第3页/共30页第三页，共31页。

System Overview第4页/共30页第四页，共31页System Overview第5页/共30页第五页，共31页 SAFETY OVERVIEW OF POTENTIAL HAZARDS The main hazards related to the PAS 5500/500, /550, /700 are:•Laser radiation, including high intensity deep ultra violet (DUV) laser radiation of 248 nm•Laser gases, including very-toxic fluorine•Mechanical movements.•Other hazards are:•Magnetic fields•Remote control of the unit using the Remote Monitoring and Control System (RMCS)System Overview第6页/共30页第六页，共31页System OverviewSYMBOLS第7页/共30页第七页，共31页。

 SYSTEM BUILDUP•The main units of the PAS 5500 can be further divided into the following subsystems:•AM (Air Mount)•ARMS (Advanced Reticle Management System)•IRIS (Integrated Reticle Inspection System)•WH (Wafer Handling)•LS (Level Sensor)•SWS (Scanning Wafer Stage)•SRS (Scanning Reticle Stage)•AL (Alignment)•IS (Image Sensor)•IP&IL (Illumination and Projection)•OA (Off-Axis illumination, ATHENA)•CT (Contamination and Temperature control)System Overview第8页/共30页第八页，共31页•Airmount Separating machine into two parts:Silent World and External World •Purpose:Vibration IsolationPosition ControlDiagnostic ToolSub-Modules第9页/共30页第九页，共31页。

•Advanced reticle management system (ARMS)PurposeThe purpose of the ARMS, is to provide a means of automatically retrieving and placing the desired reticle accurately on the reticle table. To accomplish this the system must:1. Control the Standard Mechanical InterFace (SMIF) port,2. Identify the reticles,3. Load and unload reticles to/from the library,4. Prealign the reticle on the reticle table,5. Place and remove the reticle on the reticle table,6. Import the relative machine constants and layout data (if available)Sub-Modules第10页/共30页第十页，共31页。

•WAFER HANDLING•PurposeThe WH system has two primary functions. Its first main task is to transport wafers between a carrier (or a pedestal) and the prealignment system, this task is performed by the Wafer Transport System (WTS). Its second main task is to prealign a wafer that has come from the wafer transport system, so that it can be accepted by the wafer stage. This is accomplished by the Wafer Prealignment System (WPS).Sub-Modules第11页/共30页第十一页，共31页Sub-Modules第12页/共30页第十二页，共31页Sub-Modules第13页/共30页第十三页，共31页。

Sub-Modules第14页/共30页第十四页，共31页•LEVEL SENSOR•PurposeThe PAS 5500 projects reticle images on to wafers at an extremely high resolution. High resolution can only be achieved when the wafer is accurately positioned in the optimum focal plane. The Usable Depth Of Focus (UDOF), that is the range in which images can be sharply reproduced, is only a few micrometres. When using extremely fine resolution, it can be as low as one micrometre. •The purpose of the level sensor subsystem is to:1. Determine the distance between the wafer surface and the bottom surface of the projection lens,2. Control the wafer stage level actuators to bring the wafer surface into the desired optimum image plane.Sub-Modules第15页/共30页第十五页，共31页。

Sub-Modules第16页/共30页第十六页，共31页•ALIGNMENT•PurposeThe function of the alignment system is to align the wafer to the reticle on the reticle table.The specification is critical because a wafer can be exposed up to 30 times, so good overlay accuracy is required.Sub-Modules第17页/共30页第十七页，共31页Sub-Modules第18页/共30页第十八页，共31页Sub-Modules第19页/共30页第十九页，共31页•ILLUMINATION AND PROJECTION•PurposeThe purpose of the illumination system is to expose the reticle image through the projection lens on to the wafer. The illumination system creates a light beam of high intensity and even uniformity, at reticle level, which has the proper spectral composition.Sub-Modules第20页/共30页第二十页，共31页。

Sub-Modules第21页/共30页第二十一页，共31页Basic OperationUnix System / PAS Software第22页/共30页第二十二页，共31页Basic Operation•PAS Software•PAS Software is an application software under Solaris Sys, which is a kind of Unix system.•In most cases, we operate the machine with PAS Software, but sometimes we need to type commands in command window for low level functions.第23页/共30页第二十三页，共31页Basic Operation第24页/共30页第二十四页，共31页•Main MenuBasic Operation第25页/共30页第二十五页，共31页Basic OperationMaterial MonitorWe can monitor the wafers and reticles inside the machine.第26页/共30页第二十六页，共31页。

Basic OperationCmd HdlWe can operate the all the sub-systems of the machine through this window.第27页/共30页第二十七页，共31页Basic OperationMaterial HandlingWithin this window, wafers and reticles can be loaded or unloaded from the machine.第28页/共30页第二十八页，共31页Basic OperationCmdtoolLow level unix commands can be executed in this window.第29页/共30页第二十九页，共31页感谢您的观赏(guānshǎng)！第30页/共30页第三十页，共31页内容(nèiróng)总结Course OverviewWafer transport system,IS (Image Sensor)第29页/共30页感谢您的观赏(guānshǎng)第30页/共30页第三十一页，共31页。