(英文)溅射原理和应用
Advanced Magnetron Sputtering Techniques: Principles and Applications,D. G. Teer Teer Coatings Ltd, UK,slide 2,Movchan & Demchisin,Coating Requirements,slide 3,Balzers 1980,First Successful Applications,TiN on cutting tools,slide 4,Original Ion Plating,Ion bombardment can replace the effect of temperature and provide enhanced diffusion (Mattox, 1963)AdhesionThrowing PowerDensification,Ion bombardment can replace the effect of temperature and provide enhanced diffusion (Mattox, 1963)AdhesionThrowing PowerDensification,slide 5,Requirements,Ion Energy - about 40 eVIon Current - high> 1mA/cm2,_High Ion Energy and Low Ion Current will not produce good coatings.,slide 6,Ion Plating Characteristics,slide 7,Arc Ion Plating,Hollow Cathode EB(i) Gun,Low Voltage EB(i) Gun,Practical Ion Plating Systems,slide 8,Closed Field Unbalanced Magnetron,Conventional Magnetron,Unbalanced Magnetron,Evolution of Magnetron Sputtering Techniques,slide 9,Increased Ion Current,slide 10,Ion Current Characteristics,slide 11,Flexibility Compounds Alloys Graded Coatings Multi-Layer Coatings,StabilityRepeatabilityUniformityLow Temperature,Flexibility Compounds Alloys Graded Coatings Multi-Layer Coatings,Main Advantages of CFUBMSIP,StabilityRepeatabilityUniformityLow Temperature,slide 12,CFUBMSIP,Conventional Magnetron,Bright,Finger print,Dense structure,Columnar structure,Comparison of TiN Coating Properties,Good Adhesion,Poor adhesion,slide 13,CrTiAlNDymon-iC (DLC-C:H)Graphit-iC (C/Cr)MoSTTM (MoS2/Ti),CrTiAlNDymon-iC (DLC-C:H)Graphit-iC (C/Cr)MoSTTM (MoS2/Ti),New CFUBMSIP-Derived Coatings,slide 14,Coating Deposition CFUBMSIP 1 Ti, 1 Al, 2 Cr Ar N2 OEM control loop,CrTiAlN Deposition Process,Coating Deposition CFUBMSIP 1 Ti, 1 Al, 2 Cr Ar N2 OEM control loop,slide 15,CrTiAlN Coating Sequence,Substrate (AISI M42 grade HSS, 1200 grit finish) 0.2 µm Cr bonding layer 0.3 µm CrTiAlN graded layer 4 µm nanoscale CrTiAlN multilayer, 10nm< <15nm, individual CrN layers 6.0nm,slide 16,CrTiAlN Properties,Hardness > 30 GPa Good Adhesion Lc > 60 N, HF 1 Good Wear Resistance No detectable wear after 1 hr pin-on-disc test 5mm WC/Co ball, 40 N applied load, 200 mm/s Drilling Tests Uncoated drill 0 holes TiN coated drill 100 holes CrTiAlN coated drill 225 holes,Hardness > 30 GPa Good Adhesion Lc > 60 N, HF 1 Good Wear Resistance No detectable wear after 1 hr pin-on-disc test 5mm WC/Co ball, 40 N applied load, 200 mm/s Drilling Tests Uncoated drill 0 holes TiN coated drill 100 holes CrTiAlN coated drill 225 holes,slide 17,Dymon-iC & Graphit-iC Coating Sequence,A-C:H,CrC:H,C (up to 4% Cr),CrC,slide 18,Hardness 15 GPa - 25 GPa Good Adhesion Lc 60 N Good Wear Resistance Pin-on-disc Test (1 hr, 5 mm WC/Co ball, 40 N applied load, 200 mm/s) Wear Rate Dry 10-17 m3/Nm Graphit-iC Wear Rate Under Water 10-18 m3/Nm,Dymon-iC & Graphit-iC Properties,Hardness 15 GPa - 25 GPa Good Adhesion Lc 60 N Good Wear Resistance Pin-on-disc Test (1 hr, 5 mm WC/Co ball, 40 N applied load, 200 mm/s) Wear Rate Dry 10-17 m3/Nm Graphit-iC Wear Rate Under Water 10-18 m3/Nm,slide 19,Wear resistance,Endurance,Low Friction coefficient,High load bearing capacity dry, under oil and under water,Graphit-iCTM - Performance,0.1,1,10,100,0,20,40,60,80,100,Applied Load (N),Specific Wear Rate (10-16 m3/Nm),Wear resistance,Endurance,Low Friction coefficient,High load bearing capacity dry, under oil and under water,slide 20,Dymon-iCTM & Graphit-iCTM Adhesion Properties,slide 21,Reciprocating wear test (10,000 cycles), ball Ø5mm WC-Co under 100N load (Contact pressure dry of 4GPa),Dymon-iCTM & Graphit-iCTM Wear Properties,slide 22,Dense, coherent Non-columnar structure Adherent (Lc > 80 N) Good properties at high loads,Only bottom layer is effective Good for space applications Limited in humid atmospheres Limited at high loads,MoS2 (DC sputtered in CFUBMSIP system),Initial MoS2 (RF sputtering),MoS2 Coatings,Initial MoS2 (RF sputtering),(Spalvins, Hintermann),MoS2 (DC sputtered in CFUBMSIP system),Only bottom layer is effective Good for space applications Limited in humid atmospheres Limited at high loads,Dense, coherent Non-columnar structure Adherent (Lc > 80 N) Good properties at high loads,slide 23,Development of MoS2 - MoSTTM,0,2,000,4,000,6,000,8,000,10,000,12,000,0,2,4,6,8,10,12,Friction force (N),No. of cycles,ST-3001 Reciprocating Wear Test 100 N applied load 40 %RH,slide 24,Adherence High load bearing capacity (4 GPa) Thickness (1.2µm)Wear Resistance Humidity resistance Very low coefficients of friction 1000 - 2000 HV Friction when load (µ = 0.02 at 100 N) Low specific wear rate (4.0 x 10-17 m3/Nm),Adherence High load bearing capacity (4 GPa) Thickness (1.2µm)Wear Resistance Humidity resistance Very low coefficients of friction 1000 - 2000 HV Friction when load (µ = 0.02 at 100 N) Low specific wear rate (4.0 x 10-17 m3/Nm),
